Advanced Defect Inspection Techniques For nFET And pFET Defectivity At 7nm Gate Poly Removal Process
During 7nm gate poly removal process, polysilicon is removed exposing both NFET and PFET fins in preparation for high-k gate oxide. If the polysilicon etch is too aggressive or the source and drain ...
In order to detect defects in the surfaces of dry fabric and composite prepreg, this new vision-based tactile sensor roller prototype, TacRoller, is a three-colour reflective membrane roller-shape ...
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