Intel's foundry arm says it has crossed a major lithography milestone: it has announced successful acceptance testing of ASML's TWINSCAN EXE:5200B High Numerical Aperture (High-NA) EUV scanner, one of ...

Intel’s comeback in cutting edge manufacturing is no longer a vague roadmap, it now revolves around a single, spectacular ...

Detailed price information for Taiwan Semiconductor ADR (TSM-N) from The Globe and Mail including charting and trades.

Intel has completed acceptance testing of the industry's first commercial high-NA EUV lithography system with a numerical aperture of 0.55, the ASML Twinscan EXE:5200B, laying the foundation for mass ...

B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.

Lawrence Livermore National Laboratory (LLNL) engineers and scientists, in collaboration with Stanford University, have demonstrated a breakthrough 3D nanofabrication approach that transforms ...

An investigation reveals how far China's own chip manufacturing has progressed. The technology of world market leader ASML ...

Intel recently confirmed the latest results in its partnership with ASML. The US chipmaker worked with engineers from the European corporation to install, test, and validate ...

The 26-foot-tall (8-meter-tall) cargo lander is expected to embark on its first flight during the first quarter of 2026, ...

The launch took place from New Zealand and represented Rocket Lab's 79th overall flight of the Electron rocket. Impressively, every launch in 2025 hit its designated targets, setting a new benchmark ...

The demand for artificial intelligence (AI) infrastructure is driving many stock prices higher, and one notable AI company ...

As the calendar turns to late 2025, the semiconductor industry finds itself at a historic crossroads. The global insatiable demand for high-performance AI hardware has triggered an unprecedented ...