Abstract: Self-aligned double patterning (SADP) is being considered for use at the 10-nm technology node and below for routing layers with pitches down to ~50 nm because it has better line edge ...
Double patterning technology (DPT) has matured as the lithography approach to bridge the gap between ArF water-based immersion lithography and EUV (extreme ultra violet). The adoption of the SADP ...
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